Doctor of Philosophy (PhD), Ohio University, 2016, Electrical Engineering & Computer Science (Engineering and Technology)
The technological advantages of III-nitride semiconductors (III-Ns) have been demonstrated among others in the area of light emitting applications. Due to fundamental reasons limiting growth of InGaN with high Indium content, rare earth (RE) doped III-Ns provide an alternative way to achieve monolithic red, green, blue (RGB) emitters on the same III-Ns host material. However, the excitation efficiency of RE3+ ions in III-Ns is still insufficient due to the complexity of energy transfer processes involved. In this work, we consider the current understanding of the excitation mechanisms of RE3+ ions doped III-Ns, specifically Yb3+ and Eu3+ ions, and theories toward the excitation mechanism involving RE induced defects. In particular, we demonstrate and emphasize that the RE induced structural isovalent (RESI) trap model can be applied to explain the excitation mechanism of III-Ns:RE3+. Specifically, we have investigated the Yb3+ ion doped into III-Ns hosts having different morphologies. The observed emission peaks of Yb3+ ion were analyzed and fitted with theoretical calculations. The study of Yb3+ ion doped InxGa1-xN nano-rod films with varied indium (In) concentration shown the improvement of luminescence quality from the nanorod due to the presence of Yb dopant. Then we report the optical spectroscopy and DLTS study toward an Eu and Si co-doped GaN and its control counterpart. The Laplace-DLTS and optical-DLTS system developed in this work improved spectrum resolution compared to the conventional DLTS. The high resolution L-DLTS revealed at least four closely spaced defect levels associated with the Trap B, identified with regular DLTS, with activation energy 0.259±0.032 eV (Trap B1), 0.253±0.020 eV (Trap B2), 0.257±0.017 eV (Trap B3), and 0.268±0.025 eV (Trap B4) below the conduction band edge, respectively. Most importantly, a shallow hole trap was observed at energy 30±20 meV above the valence band edge of the GaN:Si,Eu3+ which can be attributed to the RESI hole (open full item for complete abstract)
Committee: Wojciech Jadwisienczak (Advisor); Savas Kaya (Committee Member); Martin Kordesch (Committee Member); Eric Stinaff (Committee Member); Kodi Avinash (Committee Member); Harsha Chenji (Committee Member)
Subjects: Electrical Engineering; Materials Science; Nanotechnology; Optics