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Michael Presley Dissertation.pdf (11.87 MB)

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The Formation of Amorphous and Crystalline Damage in Metallic and Semiconducting Materials under Gallium Ion Irradiation

Presley, Michael
http://orcid.org/0000-0002-3362-275X
http://rave.ohiolink.edu/etdc/view?acc_num=osu1469056293

Abstract Details

2016, Doctor of Philosophy, Ohio State University, Materials Science and Engineering.
Gallium ion irradiation in dual-beam FIB microscopes is well known to cause some degree of damage during the milling process. Although it has been established that cleaning passes with low energy ions can mitigate the extent of this damage, the mechanisms, extent, and type of damage caused have not been well studied due to geometrical limitations inherent to thin foils. By adapting the needle geometry used for atom probe and tomographic work, we can directly measure the extent of damage layers created during milling. Needles were made of multiple semiconductor, intermetallic, and metal systems, confirming previous estimates of damage thickness in Si and GaAs. Materials tested fell into two distinct classes, amorphous dominated and crystalline defect dominated. Amorphous dominated materials consisted of semiconductors and narrow phase field intermetallics, fitting previous radiation work. Crystalline defect dominated materials had semi-crystalline damage layers under 5 nm at all accelerating voltages, and residual defects were shown to have significant effects on lattice clarity in HAADF-STEM. Contrast between amorphous layers in HAADF-STEM was found to be minimal even under ideal conditions, and HRTEM was necessary to accurately confirm and measure damage layer thickness. The causes and extent of damage layer minimization during low keV milling steps were shown to be consistent across all materials.
Hamish Fraser (Advisor)
Wolfgang Windl (Committee Member)
Jinwoo Hwang (Committee Member)
169 p.
Materials Science; Metallurgy; Radiation
Focused ion beam; radiation damage; FIB damage; collision cascade; sample preparation; TEM; STEM; FIB; crystalline defects; amorphous; amorphous damage; needle; damage measurement; semiconductor; metal; intermetallic;

Recommended Citations

Citations

  • Presley, M. (2016). The Formation of Amorphous and Crystalline Damage in Metallic and Semiconducting Materials under Gallium Ion Irradiation [Doctoral dissertation, Ohio State University]. OhioLINK Electronic Theses and Dissertations Center. http://rave.ohiolink.edu/etdc/view?acc_num=osu1469056293

    APA Style (7th edition)

  • Presley, Michael. The Formation of Amorphous and Crystalline Damage in Metallic and Semiconducting Materials under Gallium Ion Irradiation. 2016. Ohio State University, Doctoral dissertation. OhioLINK Electronic Theses and Dissertations Center, http://rave.ohiolink.edu/etdc/view?acc_num=osu1469056293.

    MLA Style (8th edition)

  • Presley, Michael. "The Formation of Amorphous and Crystalline Damage in Metallic and Semiconducting Materials under Gallium Ion Irradiation." Doctoral dissertation, Ohio State University, 2016. http://rave.ohiolink.edu/etdc/view?acc_num=osu1469056293

    Chicago Manual of Style (17th edition)

osu1469056293
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© 2016, all rights reserved.
This open access ETD is published by The Ohio State University and OhioLINK.