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BLOCK COPLOYMER FILMS USING SOLVENT VAPOR ANNEALING WITH SHEAR

zhang, chao
http://rave.ohiolink.edu/etdc/view?acc_num=akron1525864450107032

Abstract Details

2018, Master of Science in Polymer Engineering, University of Akron, Polymer Engineering.
The swelling and deswelling of crosslinked polydimethylsiloxane (PDMS) pad adhered to a block copolymer (BCP) film during solvent vapor annealing (SVA) provides sufficient shear force to produce highly aligned domains over macroscopic dimensions in thin films. Here, we examine how far this alignment can propagate through the depth of a BCP film to understand the limits for efficacy of the SVA-S (SVA with shear) process. Films of cylinder-forming polystyrene-block-polyisoprene-block-polystyrene (SIS) ranging from 100 nm to more than 100 µm are examined using the same processing conditions. The SIS surface in contact with the PDMS is always well-aligned, with Herman’s orientation parameter (S) exceeding 0.9 as determined from AFM micrographs, but the bottom surface in contact with the silicon wafer is not aligned for the thickest films. The average orientation through the film thickness was determined by transmission small angle x-ray scattering (SAXS), with S decreasing gradually with increasing thickness for SIS films thinner than 24 µm, but S remains > 0.8. S precipitously decreases for thicker films. A stop-etch-image approach allows the gradient in orientation through the thickness to be elucidated. The integration of this gradient agrees with the average S obtained from SAXS. These results demonstrate the effective alignment of supported thick BCP films of order 10 µm, which could be useful for BCP coatings for optical applications.
Bryan Vogt (Advisor)
Kevin Cavicchi (Advisor)
Thein Kyu (Committee Member)
66 p.
Materials Science
thermoplastic elastomer; orientation; polystyrene-block-polyisoprene-block-polystyrene

Recommended Citations

Citations

  • zhang, C. (2018). BLOCK COPLOYMER FILMS USING SOLVENT VAPOR ANNEALING WITH SHEAR [Master's thesis, University of Akron]. OhioLINK Electronic Theses and Dissertations Center. http://rave.ohiolink.edu/etdc/view?acc_num=akron1525864450107032

    APA Style (7th edition)

  • zhang, chao. BLOCK COPLOYMER FILMS USING SOLVENT VAPOR ANNEALING WITH SHEAR . 2018. University of Akron, Master's thesis. OhioLINK Electronic Theses and Dissertations Center, http://rave.ohiolink.edu/etdc/view?acc_num=akron1525864450107032.

    MLA Style (8th edition)

  • zhang, chao. "BLOCK COPLOYMER FILMS USING SOLVENT VAPOR ANNEALING WITH SHEAR ." Master's thesis, University of Akron, 2018. http://rave.ohiolink.edu/etdc/view?acc_num=akron1525864450107032

    Chicago Manual of Style (17th edition)

akron1525864450107032
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© 2018, all rights reserved.
This open access ETD is published by University of Akron and OhioLINK.
Release 3.2.12