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Pulsed Plasma Deposition of Surface Functional Thin Films

Kaiser, Nickolas R
http://orcid.org/0000-0002-3861-4062
http://rave.ohiolink.edu/etdc/view?acc_num=akron1491399151549547

Abstract Details

2017, Master of Science, University of Akron, Polymer Science.
Radio Frequency Plasma deposition has proven to be an unusually convenient and universal surface-modification and coating technology for grafting thin film for applications in which solution chemistry is difficult or entirely impossible, or adhesion to a low energy substrate surface is desired. The one-step gas to solid-phase nature of the process eliminates liquid solvents, which are otherwise required for spin coating, electro-deposition, and other traditional coating processes. The technique uses excited plasma in a volume of monomer vapor, forming reactive energetic species (radicals and ions). The recombination of surface-bound free radicals and ions with airborne radicals and oppositely charged ions creates strong substrate-independent covalent attachment at the interface. Pulsing of the incident electrical energy significantly reduces the total energy absorbed by the targeted vapor, subsequently minimizing bond scission and energetic structure rearrangement to retain useful functional groups. In this work, Terpyridine was tethered to various substrates and complexed with iron, forming a film that may readily complex with other Terpyridine-coated substrates to form an adhesive bond. Thin films of reactive anhydride were first deposited by maleic anhydride vapor in a pulsed plasma process. The highly reactive anhydride group was retained in the plasma with low input power, short duty cycle on-time, and long duty cycle off-times. A primary amine-functional Terpyridine was tethered to the anhydride film via aminolysis and heated to form a stable maleimide linkage.
Ali Dhinojwala (Advisor)
Coleen Pugh (Other)
76 p.
Chemistry; Materials Science; Polymers
Terpyridine, Pulsed Plasma Deposition, PCVD, Adhesion

Recommended Citations

Citations

  • Kaiser, N. R. (2017). Pulsed Plasma Deposition of Surface Functional Thin Films [Master's thesis, University of Akron]. OhioLINK Electronic Theses and Dissertations Center. http://rave.ohiolink.edu/etdc/view?acc_num=akron1491399151549547

    APA Style (7th edition)

  • Kaiser, Nickolas. Pulsed Plasma Deposition of Surface Functional Thin Films. 2017. University of Akron, Master's thesis. OhioLINK Electronic Theses and Dissertations Center, http://rave.ohiolink.edu/etdc/view?acc_num=akron1491399151549547.

    MLA Style (8th edition)

  • Kaiser, Nickolas. "Pulsed Plasma Deposition of Surface Functional Thin Films." Master's thesis, University of Akron, 2017. http://rave.ohiolink.edu/etdc/view?acc_num=akron1491399151549547

    Chicago Manual of Style (17th edition)

akron1491399151549547
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© 2017, all rights reserved.
This open access ETD is published by University of Akron and OhioLINK.