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Degree

MS, University of Cincinnati, Engineering : Electrical Engineering, 2003.

Abstract

In this work, new MEMS technology has been developed and characterized for the fabrication of cantilevered arrays of tapered probes with pyramidal sub-micrometer tips for near-field applications. This technology will enable use of near-field probes in applications that require high scan rates. Low optical transmission through apertures and tapered tips of near-field probes limits the scanning rate and makes it challenging to use small apertures. Higher scan rates are needed for data storage applications while resolution is important in imaging applications. The transmission coefficient of a sub-wavelength aperture is dependent upon the aperture diameter and the taper angles. Thus, there is a need to control the taper profile according to application. Probe arrays were fabricated by dicing borosilicate glass substrates and then tapered and sharpened in a two-step chemical etch process performed at room temperature. In order to tailor the tips to necessary dimensions, understanding tip formation dynamics was critical. The tip profile was dependent upon the array center-to-center spacing, probe dimensions at the end of the first etch step, and composition of the organic layer. A mathematical model was developed and solved numerically to predict taper geometry. This work demonstrates the fabrication and characterization of near-field probe arrays with customizable tip profiles. Such a scheme has the potential to simplify integration of large arrays at variable center-center spacing with CMOS photoreceiver arrays for page oriented read-out from optical storage media.

Keywords

probe arrays/MEMS; near-field optics; data storage; fabrication of,

Advisor

Dr. Ian Papautsky

Pages

91p.

Document number: ucin1061297688
Permalink: http://rave.ohiolink.edu/etdc/view?acc_num=ucin1061297688

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