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Degree

Master of Science, Miami University, Physics, 2008.

Abstract

We introduce a model of a high efficiency photonic lattice based 3-channel wavelength division demultiplexer (WDDM). A 2-D photonic crystal structure is within Si3N4 layer is fabricated within air cladding on top and SiO2 beneath. The photonic crystal used for the WDDM device has a lattice constant of 213nm and air pores of 150nm in diameter. We also devise and present a full fabrication process to fabricate a three-channel WDDM device. Electron-beam lithography is successful and the results are reported. Some problems were encountered with Cr wet etch, and the results are reported. Also, a recipe for Si3N4 plasma etching is presented.

Subject Headings

Electrical engineering; Physics

Keywords

WDDM; photonic crystal; E-beam lithography; Cr wet etch; plasma etch

Committee / Advisors

Jan M. Yarrison-Rice, PhD (Advisor)
Herbert Jaeger, PhD (Committee Member)
Perry R. Rice, PhD (Committee Member)

Pages

73p.

Document number: miami1219330454
Permalink: http://rave.ohiolink.edu/etdc/view?acc_num=miami1219330454

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